Inspection-analysis Solutions for High-quality and High-efficiency Semiconductor Device Manufacturing
نویسندگان
چکیده
OVERVIEW: Volume production of 90-nm node semiconductor products began in 2003, and research has been already well advanced on products for the next-generation 65-nm technology node. As feature sizes descend further into the deep submicrometer range, it becomes increasingly important for maintaining quality and streamlined production to exploit a range of analytical tools that are tightly integrated as a total system including (1) CD-SEM (critical-dimension scanning electron microscope) and other metrology tools, (2) defect inspection tools, (3) data collection and analysis systems, (4) SEM and TEM (transmission-electron microscope (TEM) analytical tools, and more. Hitachi Group is known for its lineup of leadingedge, high-performance metrology, inspection, and analytical tools for present and future technology nodes, but goes even further in providing inspection and analysis solutions that are tailored to the very diverse needs of individual device manufacturers. Kenji Watanabe, Dr. Eng. Aritoshi Sugimoto Mari Nozoe
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تاریخ انتشار 2003